Feb 09 – Creative Commons

The “information age” has posed new challenges to copyright protection.   IIPS is most fortunate to have Fred Benenson, Outreach Manager for Creative Commons, and Marc Jonas Block, Esq. present New Licensing Options for the Information Age on Thursday, February 19, 2009 from 6:00 to 8:00 p.m. at the IBM building (57th and Madison), Room 1220, New York, NY 10022.   Mr. Benenson and Mr. Block will discuss alternatives for creators to protect their original works, but yet encourage the sharing of ideas.
Creative Commons is a non-profit organization that provides free tools that allow authors, scientists, artists, and educators to protect their creative work with different levels of protection.   David Berry and Giles Moss view Creative Commons as providing, “institutional, practical, and legal support for individuals and groups wishing to experiment and communicate with culture more freely.” (2005)  With a Creative Commons license, a creator keeps the copyright but allows users to copy and distribute work under terms specified in the license.   Creative Commons has expanded to accommodate international copyright issues as well.   Creative Commons International was founded to adapt the licenses to the requirements of various jurisdictions and languages.  As of December, 2008 Creative Commons International has developed 50 jurisdiction-specific licenses and has 8 other jurisdictions in the drafting process.  Fred Benenson serves as Creative Commons’ Outreach Manager to advocate the adoption of Creative Commons licenses by startups, museums, artists, and musicians.  He has devoted his career to copyright reform, technology advocacy, and digital activism.   He has organized several conferences, art exhibitions, and lectures focused on free culture.  He is co-founder of Free Culture @ NYU chapter of Student Free Culture.   He earned his Masters at NYU’s Interactive Telecommunications Program.   Marc Jonas Block, Esq. is an attorney for Salon, Marrow, Dyckmann & Newman, L.L.P.  He is the author of “The Importance of Earnest Protection – The Use of Intellectual Property to Protect Artists’ Rights” and is an Adjunct Professor in the field of Legal and Business Basics for the Fashion Industry at the Fashion Institute of Technology.
The fee for non-members is $20.  Admission for law school students is $10.  The nominal $60 annual membership dues fee may be enclosed with a membership application.  Membership entitles you to attend other regular meetings during the September 2008 – September 2009 year at no charge.  If you would like to reserve your space and/or pay at the door, or if you have any questions about this program, please contact Frederick J. Dorchak at fdorchak@collardroe.com.
As with IIPS programs in general, NY CLE credit will be offered.  This seminar will provide two (2) nontransitional CLE credits.  Mail the Membership Form with annual dues, or meeting payment by February 12, 2009, 2009, to Harris Wolin at Myers Wolin, LLC, 100 Headquarters Plaza, Morristown, NJ 07960.
We look forward to seeing you in February and, as in the past, invite comments and suggestions for programs that might be of interest to you.
Sincerely,

 

Frederick J. Dorchak

IIPS President

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