The IIPS is most fortunate to have Robert B. Levy, Esq., Group Manager – Senior Patent Counsel to Thomson Licensing Inc., and Frank L. Politano, Esq., Partner in the firm of K&L Gates LLP, join us on Thursday, September 10, 2009, from 6:00 to 8:00 p.m. at K& L Gates LLP, 599 Lexington Avenue (between 52nd and 53rd Street), New York, New York in the Boardroom (32 A and B) for a panel discussion on Ethics. Mr. Levy will provide an update on Ethics in the Patent Field and Mr. Politano will provide an update on Ethics in the Trademark Field.
The fee for non-members is $20. Admission for law school students is $10. The nominal $60 annual membership dues fee may be enclosed with the membership application. Membership entitles you to attend other regular meetings during the September 2009 – September 2010 year at no charge. If you would like to reserve your space and/or pay at the door, or if you have any questions about this program, please contact Frederick J. Dorchak at firstname.lastname@example.org.
As with IIPS programs in general, NY CLE credit will be offered. This seminar will provide two (2) transitional CLE credits in Ethics. Mail the Membership Form with annual dues, or meeting payment by September 3, 2009, to Harris Wolin at Myers Wolin, LLC, 100 Headquarters Plaza, Morristown, NJ 07960.
We look forward to seeing you in September and at other upcoming events and, as in the past, invite comments and suggestions for programs that might be of interest to you.